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Author

Amit Tewari

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Open access Sep 2026

Influence of In Situ Atomic Layer Annealing and Plasma-Enhanced Atomic Layer Deposition Techniques for Low-Temperature Deposition of HfO2 High-κ Gate Dielectrics

Achieving high electrical quality gate dielectrics for thin-film transistors atop flexible substrates is a challenge due to thermal constraints imposed by the soft and sensitive substrates. This study examines a multitude of deposition pathways using rigid metal–insulator–metal (MIM) capacitors to discern effective s...

Amit Tewari, Antti Tukiainen, Jyoti Kandpal et al. · 0 citations

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