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C. Manière

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Open access Aug 2026

Electro-thermal and mechanical simulations of laser annealing perovskite films

Conventional thermal annealing of oxide thin films (>600 °C) often induces interfacial diffusion and substrate degradation, compromising structural integrity. Nanosecond pulsed laser annealing (ns-PLA) circumvents these limitations by enabling ultrafast, localized energy deposition with minimal thermal load. However, t...

A. Fouchet, Ashwin Sudarshan Suresh, C. Manière · 0 citations

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