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Review Open access May 2026

Flow physics and modeling in extreme ultraviolet sources

ABSTRACT The development of high-power extreme ultraviolet (EUV) light sources based on the laser-produced plasma (LPP) principle is crucial for advanced lithography, enabling the continued scaling of semiconductor devices. However, the underlying processes—involving laser-droplet interaction, plasma evolution, and deb...

Kaileong Chong, Bo-Fu Wang, Feng Wang et al. · 2 citations

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