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Sponsored Design Multi-Agent AI Systems Using MCP and A2A: Engineer your own Pyt Design Multi-Agent AI Systems Using MCP and A2A: Engineer your own Pyt

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F. Laulagnet

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Sep 2026

Master-based distortion correction method for wafer-scale nanoimprint lithography

Nanoimprint lithography (NIL) is a versatile and cost-effective technology enabling patterning for applications in optics, photonics and semiconductor manufacturing. Although Soft UV-NIL process enables wafer scale replication, achieving optimal overlay (OVL) accuracy remains challenging, particularly due to distortion...

Api Warsono, Jacques-Alexandre Dallery, Anaïs D'Affroux et al. · 0 citations

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