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Sponsored Artificial Intelligence: A Modern Approach, Global Edition Artificial Intelligence: A Modern Approach, Global Edition

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Ning-Chang Wang

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Open access Sep 2026

Atomistic Insights into Oxidation Mechanisms in Chemical–Mechanical Polishing of Diamond

Understanding the interfacial oxidation behavior during chemical–mechanical polishing (CMP) of diamond is important for controlling surface chemical modification and subsequent material removal. In this study, reactive force field molecular dynamics (ReaxFF MD) simulations were employed to comparatively investigate the...

Ke-Chong Wang, Yun-Kai Wang, Meng Li et al. · 0 citations

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