Hafnium-based ferroelectrics have emerged as promising candidates for next-generation non-volatile memory technologies owing to their excellent complementary metal–oxide–semiconductor (CMOS) compatibility and exceptional thickness scalability. However, the defect mechanisms governing the evolution of ferroelectricity a...
Xue-Pei Wang, Jin-Hao Liu, Hao-Bo Lin et al.· Moore and More· 0 citations
Low-voltage hafnia-based ferroelectric memory is essential but remains challenging because conventional strategies, such as thickness scaling or mean coercive field reduction, often incur leakage or remanent polarization (Pr) penalties. A key but often overlooked factor is that EC is not a single value but exhibits a b...
Jin-Hao Liu, Xue-Pei Wang, Hui-Hui Li et al.· Applied Physics Letters· 0 citations
CMOS device aging critically challenges digital circuit design, where conventional timing analysis struggles with the large number of input conditions, standard cells, and process corners. This work proposes ATAN, a novel framework for accelerating aging-aware timing analysis, employing a hybrid graph neural network. S...
Ye-Wei Zhang, Jin-Feng Ye, Hui-Zhen Qiu et al.· Microelectronics and reliabi...· 0 citations
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