Sep 2026
A lab-scale EUV high-intensity exposure setup for small-spot exposures and angular-resolved photoelectron spectroscopy
This work investigates extreme ultraviolet (EUV)-induced photoemission in materials relevant for EUV lithography, combining synchrotron-based X-ray photoelectron spectroscopy (XPS and ARPES) measurements with Monte Carlo photoemission modeling. Gold (Au) is used as a reference material to benchmark the model, while rut...
Linus Nagel, Adelind Elschani, Sarah Schreyer et al.
· Photomask Japan · 0 citations