S. Moon

Electrophoresis-driven agglomeration enables filtration-based removal of sub-100 nm silica nanoparticles from semiconductor industry-grade processing chemicals.

Trace sub-100 nm impurities in processing chemicals represent a major yield-limiting challenge for sub-10 nm semiconductor manufacturing because they are difficult to remove using conventional purification methods. Mechanical filtration is ineffective for capturing nanoparticles smaller than 100 nm, while dielectrophor...