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Yun-Lu Sun

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Sep 2026

High-resolution dual-layer two-photon lithography for nanoscale patterning.

Multi-photon lithography (MPL), which predominantly utilises femtosecond lasers, is a significant maskless, high-resolution and ambient (non-vacuum) lithography technique. To achieve a comparable resolution to primary competing solutions, such as electron-beam lithography, and to improve processing efficiency or throug...

Chen-Ran Zhang, Yun-Lu Sun, Zi-Feng Xiao et al. · 0 citations

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