Zachariah Ngan

A self-consistent hybrid global–2D model for SF 6 /Ar inductively coupled plasma etchers with neural-network surrogate acceleration

We present a self-consistent hybrid global–2D model for reactor-scale simulation of SF 6 /Ar ICP etching. Unlike prior reactor-scale hybrids, which couple two spatial solvers, the framework couples a 0D global SF 6 /Ar chemistry solver to a 2D axisymmetric electromagnetic and species-transport solver through a...