Oct 2026· Advances in X-Ray/EUV Sources, Optics, and Components XXI· pp. 8· 0 citations
Abstract
High‑accuracy metrology is essential for fabricating and optimizing free‑form X‑ray mirrors, where nanometer‑scale precision demands reliable calibration of instrument performance. Binary pseudo‑random array (BPRA) “white‑noise” artifacts enable direct determination of an instrument’s transfer function (ITF). To extend this capability to spherical and aspherical‑wavefront Fizeau interferometers, we developed a hybrid calibration standard that integrates a BPRA pattern with a reflection computer‑generated hologram (CGH), enabling efficient characterization of interferometers in their specific experimental configurations.
We applied this BPRA‑based technique to the GSFC FizCam 2000, a short‑coherence Fizeau interferometer. ITF measurements demonstrated nearly an order‑of‑magnitude improvement in lateral resolution when using a tangentially tilted optic under test. These results highlight the strong potential of BPRA‑CGH standards for advancing cylindrical‑wavefront metrology at NASA. We also identified limitations of CGHs under short‑coherence operation and are refining BPRA designs to enable high‑confidence Fizeau interferometry for mission‑specific optics.
Interferometric testing of powered optics provides high accuracy but relies on reference optics, precise alignment, and a stable environment. This study presents a non-interferometric multiplane-accelerated Wirtinger flow (MP-AWF) method for recovering spherical-lens wavefronts from axially sampled diffraction intensit...
We developed a compact imaging Fourier transform infrared (FT-IR) spectrometer based on wavefront-division interferometry for planetary exploration and small-satellite missions. The instrument covers 4–20 μm with a wavenumber resolution of 3.8 cm−1 and a spatial resolution of 34 μm. The optical system uses two Zernike...
Biao Zhao, Yasuhiro Hirahara, Seiichi Hata et al.· Astronomical Telescopes + In...· 0 citations
High numerical aperture (NA) microscope objectives are critical in semiconductor wafer defect inspection. Conventional wavefront measurement approaches are limited by the precision of reference wavefronts and inherent systematic errors, which restricts their performance in high-precision metrology. To address these iss...
William Yang Wang, Xin-Hua Chen· International Conference on...· 0 citations
High-accuracy characterization of optical grating pitch is increasingly important for the quality control of diffractive optical elements, particularly in the emerging augmented reality optics. To address the limitations of conventional measurement methods, such as AFM and diffractometry, we present a snap-shot interfe...
Aleksi Mattila, A. Lassila· EPJ Web of Conferences· 0 citations
Plane wavefront Fizeau interferometry (PWFI) is one of the major metrology techniques for surface characterization of xray optics in the low and middle spatial frequency range. However, PWFI measurements of curved optics are often associated with significant systematic effects arising from complex phenomena, including...
V. Yashchuk, K. Munechika, H. Barnard et al.· Advances in X-Ray/EUV Source...· 0 citations
The modulation transfer function (MTF) is an established metric to evaluate the quality of an imaging system. Nevertheless, this method does not provide detailed, diagnostic information about wavefront aberrations. MTF tells us if a system passes or fails required criteria. However, wavefront testing tells us what type...
Eric Stover, Magnus Nahlinger, Kati Schinckel et al.· Optical Manufacturing and Te...· 0 citations
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